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Chemical Vapor Deposition

Journal Abbreviation: CHEM VAPOR DEPOS
Journal ISSN: 0948-1907

About Chemical Vapor Deposition

    Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews.<br/><br/>All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.
Year Impact Factor (IF) Total Articles Total Cites
2022 (2023 update) - -
2021 - -
2020 - -
2019 - -
2018 - -
2017 2.227 0 1354
2016 1.333 0 1219
2015 1.789 44 1397
2014 1.703 46 1327
2013 1.371 44 1519
2012 1.316 47 1244
2011 1.796 50 1203
2010 1.804 45 1246

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